New in 2021: “Journal of Optical Microsystems”

SPIE, the international society for optics and photonics, has announced the launch of a new Gold Open Access journal, the Journal of Optical Microsystems (JOM), which will publish cutting-edge research of optical and photonic microsystems. Hans Zappe, co-editor-in-chief of SPIE’s Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), will serve as editor-in-chief of the new journal. Concurrently, JM3 will be renamed the Journal of Micro/Nanopatterning, Materials, and Metrology, retaining its familiar acronym. JM3 co-editor-in-chief Harry Levinson will lead that journal, which will focus on lithographic technologies.

Hans Zappe (left), Harry Levinson (Source: SPIE)

Since 2002, JM3 has published papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries.

The renamed JM3 will publish peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies.

JOM will publish research in all aspects of optical and photonic microsystems, from materials and fabrication of micro-optical and photonic components, through assembly and packaging, to systems and applications. JOM will open for submissions in May 2020 and all publication charges will be waived through 2021.

“One of the challenges in the pursuit of excellence that was noted by prior editors-in-chief of the original JM3 has been its excessively wide scope, serving multiple diverse technical communities,” noted Levinson.

“These two journals are now ideally positioned to serve their respective communities,” added Zappe. “With a clear focus on their readerships, both academic and industrial, they will provide a very attractive publication venue for authors working in the lithography or microsystems fields.”

Levinson, a consultant at HJL Lithography, is a former senior director of Global Foundries’ strategic lithography technology organization. He spent nearly all of his career working in the field of lithography, starting at Advanced Micro Devices. He also served for several years as the chairman of the USA Lithography Technology Working Group, which helped generate the lithography chapter of the international technology roadmap for semiconductors.

Zappe is a leading international researcher in the areas of optical microsystems and micro-optical components and has made fundamental contributions to the state of the art in fluidic imaging systems, tunable lenses, and adaptive optics. He worked at IBM, the Fraunhofer Institute for Applied Solid-State Physics IAF and the Centre Suisse d’Electronique et de Microtechnique, CSEM, before joining the department of microsystems engineering at the University of Freiburg in 2000. As part of his extensive research activities, Zappe founded the priority program “active micro-optics” and the collaborative research center “planar optronic systems”, both funded by the German Research Foundation. He has chaired a wide range of international conferences and previously served on the editorial boards of numerous optics and microsystems journals. (Source: SPIE)

Link: SPIE Journals, SPIE, the international society for optics and photonics, Bellingham, Wash., USA

 

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