Growing Demand for Diamond Windows Due to EUV Lithography

II-VI will double its manufacturing capacity of large area diamond by the end of calendar year 2019. (Source: II-VI)

II‐VI Incorporated, a leading provider of engineered materials and optics, announced that it is expanding its manufacturing capacity of large area diamond windows for Trumpf’s high power carbon dioxide (CO2) lasers embedded in extreme ultraviolet (EUV) lithography systems.

The demand for diamond windows has accelerated with the increased shipments of EUV lithography systems to advanced microelectronics manufacturers. II-VI will double its manufacturing capacity of large area diamond windows by the end of calendar year 2019.

“II-VI is a strategic supplier of high performance CVD diamond windows for our high power CO2 laser systems that enable EUV lithography,” said Dr. Michael von Borstel, president and CEO, Trumpf Lasersystems for Semiconductor Manufacturing. “II-VI’s investment in large area diamond window manufacturing capacity will enable us to meet the growing demand for our systems.”

“II-VI produces diamond windows as large as 150 millimeters in diameter, the largest available on the market today,” said Stacey Armagost, vice president of strategic marketing, II-VI Laser Solutions. “This product builds upon 45 years of material growth and processing experience and is the result of a very long and close collaboration with Trumpf to support a growing market.”

II-VI manufactures diamond using its proprietary microwave plasma chemical vapor deposition (CVD) processes with equipment engineered in-house. II-VI’s diamond windows exceed requirements in flatness and finish for high power laser optics applications. (Source: II-VI)

Links: TRUMPF GmbH + Co. KG, Ditzingen, GermanyII-VI Incorporated, Saxonburg, PA, USA

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