FIB-SEM for Nanofabrication

Focused Ion Beam-SEM “Velion” for FIB-centric nanofabrication, the world’s only FIB-SEM which truly defines FIB as the priority technique. The system and its fascinating application range will be presented at the EIPBN in Puerto Rico (May 29 to June 1).

To meet the most demanding requirements both in R&D nano prototyping as well as sample preparation and microscopy, the ion column is installed vertically in the system. Supported by a proprietary fast field emission SEM column and its unique Laser Interferometer Stage, the SEM is equipped for various research and development tasks. It provides versatile FIB nanofabrication across large areas with all direct and 3D patterning techniques. Complementing Electron Beam Lithography it helps to achieve scientific results faster by easy in-situ optimization and less process steps. At the same time sample preparation and inspection applications like X-section analysis and TEM lamella are enabled by live high resolution SEM imaging. FIB and even multiple non-contaminating ion species beyond Gallium and new patterning approaches are now available with lithography class stability and precision.

Raith GmbH
Konrad-Adenauer-Allee 8
44263 Dortmund, Germany
Phone: +49 (0)231 95004-0
Fax: +49 (0)231 95004-460